Chanana, Ravi Kumar. “Interrelated Channel Current and Oxide Leakage Current Density in a MOSFET Device”. European Journal of Applied Sciences 12, no. 5 (September 6, 2024): 21–22. Accessed February 4, 2026. https://www.journals.scholarpublishing.org/index.php/AIVP/article/view/17525.